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Wet Equipment-CSE

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  • 公司名稱南通華林科納半導(dǎo)體設(shè)備有限公司
  • 品       牌
  • 型       號
  • 所  在  地南通市
  • 廠商性質(zhì)生產(chǎn)廠家
  • 更新時間2025/2/13 9:12:00
  • 訪問次數(shù)55
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華林科納半導(dǎo)體設(shè)備技術(shù)有限公司成立于2008年3月,投資4500萬元。主要從事半導(dǎo)體設(shè)備、液晶濕制程設(shè)備、太陽能光伏設(shè)備、藍(lán)寶石加工設(shè)備的研發(fā)、技術(shù)推廣和生產(chǎn)銷售。

      公司一直秉承“以質(zhì)量為生存,以創(chuàng)新求發(fā)展”的經(jīng)營理念,不堅(jiān)持比客戶對自己的需求了解更多,以優(yōu)質(zhì)的產(chǎn)品和優(yōu)良的服務(wù)贏得了各界用戶的贊許和信賴。

     華林科納公司通過與上公司的廣泛合作,目前已形成濕法清洗系統(tǒng)、刻蝕系統(tǒng)、CDS系統(tǒng)、尾氣處理系統(tǒng)的四大系列數(shù)十種型號的產(chǎn)品,廣泛應(yīng)用與大規(guī)模集成電路、電力電子器件、分立器件、MEMS和太陽能電池等領(lǐng)域

    主要設(shè)備有:配液機(jī)   IPA干燥機(jī)   化學(xué)品恒溫機(jī) 、化學(xué)試劑分裝機(jī)、濕法清洗系統(tǒng)、刻蝕系統(tǒng)、CDS系統(tǒng)、尾氣處理系統(tǒng)

配液機(jī),IPA干燥機(jī),化學(xué)品恒溫機(jī),化學(xué)試劑分裝機(jī),濕法清洗系統(tǒng)、刻蝕系統(tǒng)、CDS系統(tǒng)、尾氣處理系統(tǒng)
WetEquipment- WetequipmentNantongSemiconductorEquipmentCo
Wet Equipment-CSE 產(chǎn)品信息

Wet Equipment-

Wet equipment Nantong Semiconductor Equipment Co. Ltd. is suitable for many applications, including cleaning, etching, stripping, developing etc.

Advantages of wet process equipment

> wet equipment is suitable for many applications, including cleaning, etching, degumming and developing

> covers an area of small area

> reliability is strong

> unique module structure

Easy maintenance and maintenance, low cost

> maximum compatible application

Each module's separate air exhausting device

> easy to install and update modules based on the manipulator system

Characteristics and advantages

Many different cleaning processes, such as RCA, IMEC, Pre-Diffusion, Pre-Metal, and various etching processes, including oxidation

Compounds, nitrides, polysilicon, metals, silicides, and nitric compounds

General characteristics

> for standard or low side flower baskets

Individual modules of each module; effective discharge of acids, alkalis, neutrality, and gas produced by the solvent

The process of drying out

Intelligent self rescue and emergency stop function of wafer

Powerful, simplified scheduler

Process control ability

The batch follows the whole process

Setting parameter tracking, including temperature, flow, resistivity, chemical measurement, etc.

> batch tracking, error information documents, process real-time monitoring, user level setting

Graphical user interface

> based on the B&R CPU and IPC interface, the size is 17 inches

Edit menu

> real time flowchart

Auto save (EOR, ERR, ChemLog, etc.)

> multilevel cipher

> network remote control

Train

Operation, maintenance and process training

option

> automatic wafer loading and transmission

> wafer ID recognition

> flower basket buffering function

> dry into wet out and wet to dry out (manually loading the wafer area ozone system)

Suitable for size (150, 200 or 300 mm)

Waste liquid management system

Locally installed chemical preparatory grooves for dilution, mixing and chemical liquid preheating devices

Deionized water heating system

Laminar flow

Concentration monitoring system

> deionized water supply point filtration

Fire extinguishing device

> components

> and so on.

reliability

MTBF > 800 H

The average time interval of more than 300 h auxiliary

But the running time is more than 97%

Assembly and shipping

Semiconductor wet cleaning equipment more concerned about the Nantong semiconductor equipment limited company website: ; now consulting can obtain the relevant project in wet cleaning equipment for free

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