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Single cavity vertical dryer -CSE

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  • 公司名稱南通華林科納半導體設備有限公司
  • 品       牌
  • 型       號
  • 所  在  地南通市
  • 廠商性質生產(chǎn)廠家
  • 更新時間2025/2/13 9:05:09
  • 訪問次數(shù)476
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華林科納半導體設備技術有限公司成立于2008年3月,投資4500萬元。主要從事半導體設備、液晶濕制程設備、太陽能光伏設備、藍寶石加工設備的研發(fā)、技術推廣和生產(chǎn)銷售。

      公司一直秉承“以質量為生存,以創(chuàng)新求發(fā)展”的經(jīng)營理念,不堅持比客戶對自己的需求了解更多,以優(yōu)質的產(chǎn)品和優(yōu)良的服務贏得了各界用戶的贊許和信賴。

     華林科納公司通過與上公司的廣泛合作,目前已形成濕法清洗系統(tǒng)、刻蝕系統(tǒng)、CDS系統(tǒng)、尾氣處理系統(tǒng)的四大系列數(shù)十種型號的產(chǎn)品,廣泛應用與大規(guī)模集成電路、電力電子器件、分立器件、MEMS和太陽能電池等領域

    主要設備有:配液機   IPA干燥機   化學品恒溫機 、化學試劑分裝機、濕法清洗系統(tǒng)、刻蝕系統(tǒng)、CDS系統(tǒng)、尾氣處理系統(tǒng)

配液機,IPA干燥機,化學品恒溫機,化學試劑分裝機,濕法清洗系統(tǒng)、刻蝕系統(tǒng)、CDS系統(tǒng)、尾氣處理系統(tǒng)
Single cavity vertical dryer -CSE
Single cavity vertical dryer -CSE 產(chǎn)品信息

Single cavity vertical dryer -

Application of cleaning system to various cleaning and drying processes

Advantage

cleaning system is applied to various cleaning and drying processes

Different configurations (devices that can be placed on desktop operations, single independent, double chambers)

> > for wafer size to 200mm

> best area, equipment with rollers can be moved

Superior reliability

Unique modular structure

> it is extremely easy to repair

Easy to use and operate

The cleaning and drying machine is equipped with two kinds of automatic and manual systems. It is capable of complicate and different process requirements. Its stability and ease of operation will bring additional economic benefits to any factory. RinseSte can handle wafers of different sizes. The software program that studies the design makes the operator get the best control.

The cleaning machine is one of many industrial partners who seek economic benefits through the pursuit of productivity, stability and ease of use.

A good choice, the standard configuration of the equipment is fully capable of realizing the cleaning and drying process of all the ordinary wafers on the market.

Characteristics and advantages

application

After a variety of process cleaning

General characteristics

> > applies to the diameter of the wafer to 200mm

25 wafer single box process

Standard high edge and low side basket

Optional built-in resistivity detection sensor to control the cleaning process of wafer

Using cold or hot N2 to assist the wafer drying

It is easy to replace the centrifugal head

Graphical interface

Color 5.7 "touch screen based on PLC

> can edit more than 10 menus, each menu can have 10 steps

> multilevel user density

General installation parameters

Size: according to customer configuration requirements (long x wide x high)

Rated voltage: 230 VAC

Rated frequency: 50 Hz / 60 Hz

Rated current: 1 x 16 A (etc.)

Train

Operation, maintenance, process training

option

> the electrostatic device is installed in the process chamber area

Deionized water recovery

Resistivity monitoring device

Automatic loading of mechanical hand

> equipment for table operation, single independent, double chamber

> > SECS/GEM

Deionized water heating system

> base placement of stainless steel roller

Solvent extinguisher

> a flower basket for special design

More information about the dryer cleaning equipment, you can pay attention to the website (www.hlkncse. COM), now the hotline consulting can immediately get the relevant solutions for the dryer cleaning equipment

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